OPTICAL-EMISSION END-POINT DETECTING FOR MONITORING OXYGEN PLASMA A-C-H STRIPPING

Authors
ALVES MAR BRAGA ED FISSORE A CESCATO L
Citation
Mar. Alves et al., OPTICAL-EMISSION END-POINT DETECTING FOR MONITORING OXYGEN PLASMA A-C-H STRIPPING, Vacuum, 49(3), 1998, pp. 213-215
Citations number
6
Categorie Soggetti
Physics, Applied","Material Science
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
49
Issue
3
Year of publication
1998
Pages
213 - 215
Database
ISI
SICI code
0042-207X(1998)49:3<213:OEDFMO>2.0.ZU;2-H
Abstract
The stripping of amorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from el ectronically excited CO, H and O species in the visible region of the spectrum. The end point has been detected by monitoring the emission i ntensity of O reactive species (777.2 nm) and CO emission (483.5 nm) i ntensity of the etching product. (C) 1998 Elsevier Science Ltd. All ri ghts reserved.