Although there has been strong demand for low -resistance, highly reli
able Ohmic contacts for compound semiconductors to realize high-freque
ncy transistors, high-power devices, and light-emitting (LED) and lase
r diodes (LD), development of the Ohmic contact technologies has been
made on a trial-and-error basis. The primary reason is lack of fundame
ntal data to design ideal metal/semiconductor interfaces due to comple
xity of elements involved at the interfacial reaction. In this article
, we review recent systematic studies carried out for Ohmic contact ma
terials to n-GaAs and then address critical issues to apply the method
ology established in nGaAs to develop low-resistance Ohmic contacts fo
r p-ZnSe and p-GaN, which are desperate for blue-green LED and LD.