R. Pintaske et al., SPECTROSCOPIC STUDIES OF A MAGNETRON SPUTTERING DISCHARGE FOR BORON-NITRIDE DEPOSITION, Surface & coatings technology, 99(3), 1998, pp. 266-273
Magnetron sputtering discharges for the deposition of cubic boron nitr
ide have been investigated using optical emission spectroscopy and Lan
gmuir double probes. Spatially resolved measurements revealed the inho
mogeneous discharge structure with respect to the distribution of exci
ted species, electron density and electron temperature. The optical em
ission spectra were analysed by means of the corona model. The vibrati
onal excitation of the nitrogen molecule was examined. The ratio of se
lected Ar and N-2 emission intensities provided a qualitative measure
of the electron temperature, which was determined by probe measurement
s. However. the intensity ratios of Ar and Ar+ lines did not correspon
d to changes in electron temperature. Varying the electron density in
a wide range, it could be demonstrated that the excitation mechanisms
do not remain constant, mainly due to multistep excitation. The vibrat
ional temperature of N-2 (C-3 Pi(u)) has been found to be much higher
in the case of r.f. sputtering than in the d.c. mode. (C) 1998 Elsevie
r Science S.A.