CATHODIC ARC TITANIUM NITRIDE IN-SITU PROCESS FEEDBACK-CONTROL FOR MULTILAYER DEPOSITION

Increases in thin film coating process-quality standard requirements, such as the national aerospace defense contractors accreditation progr am (NADCAP) and ISO9000 have forced improvements in existing depositio n process technology. Improved process traceability and performance ar e now required. In situ process-control of cathodic arcs provides a me thod of consistent film deposition by unmasking internal process dynam ics that are otherwise not observed by sensors at the process boundari es. Increased film quality and yield is realized, utilizing plasma emi ssion spectroscopy for in situ feedback control. The feedback control was demonstrated to stabilize process performance, enabling repeatable runs and reduction of coating contamination. (C) 1998 Elsevier Scienc e S.A.