A fluidic proportional amplifier device is fabricated using three-dime
nsional silicon micromachining. The technology involves deep vertical
dry etching to fabricate the amplifier midsection, and three-dimension
al passage etching from the back side, followed by glass anodic bondin
g on the front side. In order to optimize the device performance, the
amplifier geometries are designed using three-dimensional CFD (computa
tional fluid dynamics) flow analysis. The device performance is measur
ed using nitrogen as the working fluid. The experimentally measured va
lue of the amplifier gain is 3.15.