M. Aguilarfrutis et al., OPTICAL AND ELECTRICAL-PROPERTIES OF ALUMINUM-OXIDE FILMS DEPOSITED BY SPRAY-PYROLYSIS, Applied physics letters, 72(14), 1998, pp. 1700-1702
The optical and electrical characteristics of spray pyrolysis deposite
d aluminum oxide films are reported. The films were deposited from a s
praying solution of aluminum acetylacetonate in N,N-dimethylformamide
using an ultrasonic mist generator on (100) Si substrates. The additio
n of water mist during the spraying deposition process resulted in an
overall improvement of the films characteristics. The substrate temper
ature during deposition was in 450-650 degrees C range. Deposition rat
es up to 90 Angstrom/s were obtained depending on the spraying solutio
n concentration and substrate temperature with an activation energy of
the order of 31 kJ/mol, The optical energy band gap for these films w
as 5.63 eV and the refractive index at 630 nm up to 1.66 was measured
by ellipsometry, The electrical characteristics of the films were dete
rmined from the capacitance and current versus voltage measurements of
metal-oxide-semiconductor (MOS) structures incorporating them. A diel
ectric constant of 7.9, interface states density of the order of 10(11
) X 1/eV cm(2) as well as breakdown fields higher than 5 MV/cm were de
termined in this way. (C) 1998 American Institute of Physics. [S0003-6
951(98)03514-1].