Rw. Gao et al., MAGNETISM AND ITS DEPENDENCE ON ANNEALING TEMPERATURE FOR SPUTTERED CO CU MULTILAYER/, JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 14(2), 1998, pp. 139-142
Citations number
13
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
Magnetism and its dependence on annealing temperature for r.f. sputter
ed Co/Cu multilayers have been investigated. It was found that the eas
y magnetization axes of the films are parallel to the substrate and th
e magnetic properties of both as-sputtered and annealed multilayers ar
e isotropic in the film plane. The coercive field H-c is 4.8 kA/m and
the ratio of remanence-to-saturation magnetization M-Gamma/M-s is abou
t 0.73 for as-sputtered samples. Both H-c and M-Gamma/M-s increase wit
h increasing annealing temperatures, especially when annealing tempera
tures are higher than 400 degrees C. These experimental results can be
interpreted using the ferromagnetic exchange coupling and the pinning
theory of the coercivity.