SURFACE-MORPHOLOGY DEPENDENCE OF PLASMON INELASTIC-SCATTERING IN RHEED

Using a novel energy loss spectroscopy detector, we investigate the co ntributions of elastically and plasmon inelastically scattered electro ns to the oscillating reflection high energy electron diffraction (RHE ED) pattern during molecular beam epitaxy of GaAs and AlAs. While main taining the spatial and temporal resolution of a typical RHEED system, we obtain an energy resolution that is better than 2 eV. The ratio of elastic and plasmon inelastic contributions is found to depend on sur face morphology. Exclusion of inelastic scattering does not affect the phase of RHEED intensity oscillations. (C) 1998 Elsevier Science B.V.