An arc-discharge ion source is described, which is capable of producin
g a gas ion beam with a cross-section area of 80 cm(2), an ion energy
of less than or equal to 1.5 keV, a beam current density above 1.5 mA/
cm(2), and a nonuniformity of the ion current density distribution acr
oss the beam not exceeding 10%. The source was used for the ion beam e
tching of various materials; the maximum etching rate was 6-8 mu m/h.