AN AUTOMATED APPARATUS FOR CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FILMSIN A DIRECT-CURRENT DISCHARGE

An experimental automated apparatus for synthesizing polycrystal line diamond films on substrates with a diameter up to 60 mm by the chemica l vapor deposition technique is described, A characteristic feature of the apparatus is a fully automated diamond-deposition process with PC -specified and automatically controlled parameters within required ran ges, The apparatus makes it possible to operate simultaneously with si x different gases and to set their flow rates independently within wid e ranges. It is shown that the apparatus produces polycrystal diamond films with preassigned physical characteristics.