A nondestructive, noncontact method of imaging resistance variations a
long electrical conductors is described. It is especially suitable for
locating resistance variations in interconnect lines buried beneath l
ayers of passivation. In its implementation, an intensity modulated la
ser beam is scanned over the circuit carrying a de current and the vol
tage induced in the circuit at the modulation frequency is used to var
y the intensity of a synchronously scanned display. Resistance variati
ons, such as caused by defects, produce variations in the image thereb
y identifying their spatial location. Under certain circumstances, oth
er features in the immediate vicinity of the conductors, such as reman
ent photoresist and decohered interfaces, can also be imaged. An advan
tage of the method is that the electrical circuitry in the device or p
ackage call be used. (C) 1998 American Institute of Physics.