ELECTROPLATING FROM CONCENTRATED CR(III) SULFATE-SOLUTIONS AND THE PROPERTIES OF CHROMIUM DEPOSITS

Authors
EDIGARYAN AA POLUKAROV YM
Citation
Aa. Edigaryan et Ym. Polukarov, ELECTROPLATING FROM CONCENTRATED CR(III) SULFATE-SOLUTIONS AND THE PROPERTIES OF CHROMIUM DEPOSITS, Protection of metals, 34(2), 1998, pp. 95-100
Citations number
8
Categorie Soggetti
Metallurgy & Metallurigical Engineering
Journal title
Protection of metals → ACNP
ISSN journal
00331732
Volume
34
Issue
2
Year of publication
1998
Pages
95 - 100
Database
ISI
SICI code
0033-1732(1998)34:2<95:EFCCSA>2.0.ZU;2-E
Abstract
A new Cr(III) sulfate solution, containing oxalic acid as a ligand and aluminum sulfate as a buffer agent, is proposed for chrome plating. T he kinetics of the multistage discharge of Cr3+ ions and the propertie s of the formed chromium layers are studied. Hard but sufficiently duc tile layers of a thickness up to 50 mu m are formed in the solution pr oposed. The deposition rate is 0.8-1.0 mu m/min, independent of the du ration of deposition (the thickness of coating).