ELECTROCHEMICAL-BEHAVIOR OF CERTAIN ELECTROPLATES IN SOLUTIONS FOR COULOMETRIC DETERMINATION OF THEIR THICKNESSES - I - BEHAVIOR OF NICKEL ELECTROPLATES

Citation
Y. Vegis et L. Simanavichus, ELECTROCHEMICAL-BEHAVIOR OF CERTAIN ELECTROPLATES IN SOLUTIONS FOR COULOMETRIC DETERMINATION OF THEIR THICKNESSES - I - BEHAVIOR OF NICKEL ELECTROPLATES, Protection of metals, 34(2), 1998, pp. 116-122
Citations number
20
Categorie Soggetti
Metallurgy & Metallurigical Engineering
Journal title
ISSN journal
00331732
Volume
34
Issue
2
Year of publication
1998
Pages
116 - 122
Database
ISI
SICI code
0033-1732(1998)34:2<116:EOCEIS>2.0.ZU;2-0
Abstract
The anodic behavior of nickel electroplates was studied by potentiodyn amic and chromopotentiometric methods on rotating disk electrodes in s olutions used for the coulometric determination of their thicknesses. The current-maximum height on voltammograms varies in direct proportio n to the electrode rotation rate and in inverse proportion to the conc entration of the main component of a studied solutions, i.e., NH4NO3 o r HCl. Chronopotentiograms obtained at different fixed rates of anodic dissolution reveal a parallel nonfaradaic process, the contribution o f which can exceed the contribution of main electrochemical processes. The anions NO3- and Cl- in the electrolyte, under certain conditions, can behave as depositing anions. On this basis, the existence of nick el nitrate or chloride salt films as the cause of passivation and the accompanying nonfaradaic process, respectively, is supposed. It is sho wn that the solution nitrate composition recommended by ISO for measur ing the thickness of nickel electroplates needs to be specified more p recisely.