Gg. Gladush et al., SPECIAL FEATURES OF GASDYNAMIC AND DIFFUSION-PROCESSES IN REACTORS FOR DEPOSITION OF THIN-FILMS, High temperature, 36(2), 1998, pp. 263-268
Numerical analysis is made of the regularities of the flow and mass tr
ansfer in chemical reactors designed for the application of thin films
using plasma jets. The flow of a nonviscous gas with the diffusion of
minor impurity in a reactor with recurrent streams is investigated. I
t is shown that the behavior of the flow substantially depends on the
geometric parameters of the facility, in particular, on the ratio betw
een the chamber width and the transverse dimension of the inlet jet. T
he specific features of mass transfer in wide and narrow jets are stud
ied, which are due to the diffusion and vortex motion of gas.