SPECIAL FEATURES OF GASDYNAMIC AND DIFFUSION-PROCESSES IN REACTORS FOR DEPOSITION OF THIN-FILMS

Numerical analysis is made of the regularities of the flow and mass tr ansfer in chemical reactors designed for the application of thin films using plasma jets. The flow of a nonviscous gas with the diffusion of minor impurity in a reactor with recurrent streams is investigated. I t is shown that the behavior of the flow substantially depends on the geometric parameters of the facility, in particular, on the ratio betw een the chamber width and the transverse dimension of the inlet jet. T he specific features of mass transfer in wide and narrow jets are stud ied, which are due to the diffusion and vortex motion of gas.