Y. Yoshida et al., CHEMICAL-DEPOSITION OF FOREIGN METALS ON A PD SHEET AND ITS APPLICATION TO CONTINUOUS HYDROGENATION OF 4-METHYLSTYRENE, Journal of electroanalytical chemistry [1992], 444(2), 1998, pp. 203-207
Chemical deposition of foreign metals such as Pt, Au, Cu and Zn on a P
d sheet was carried out by using hydrogen atoms passing through the Pd
sheet (thickness, 50 mu m) which served as a working electrode for wa
ter electrolysis to produce H atoms, a separator between the electroch
emical and chemical reaction compartments, a selectively permeable mem
brane of H atoms and a chemical reaction field for hydrogenation. The
amounts of Pt and Au were found to increase linearly with electrolysis
time in the 6 M KOH side of a two-compartment cell, whereas Cu and Zn
were scarcely deposited (less than 0.2 mg cm(-2)). This result can be
explained in terms of the dissociative adsorbability of hydrogen on t
hese metals. Its application to the hydrogenation of 4-methylstyrene w
as also investigated by using the same electrochemical cell. It became
clear that the deposition of noble metals such as Pt and Au on a Pd s
heet greatly improves the hydrogenation rate of 4-methylstyrene as com
pared with a bare Pd sheet, while no hydrogenation products were detec
ted in the case of the Pd sheet on which Cu or Zn had been deposited.
This is because, in contrast to Pd, Pt and Au, both Cu and Zn have onl
y very weak catalytic activity for hydrogenation, and they rather supp
ress the hydrogen diffusion through the Pd sheet, as proved by measure
ments of H permeation. (C) 1998 Elsevier Science S.A. All rights reser
ved.