CHEMICAL-DEPOSITION OF FOREIGN METALS ON A PD SHEET AND ITS APPLICATION TO CONTINUOUS HYDROGENATION OF 4-METHYLSTYRENE

Citation
Y. Yoshida et al., CHEMICAL-DEPOSITION OF FOREIGN METALS ON A PD SHEET AND ITS APPLICATION TO CONTINUOUS HYDROGENATION OF 4-METHYLSTYRENE, Journal of electroanalytical chemistry [1992], 444(2), 1998, pp. 203-207
Citations number
15
Categorie Soggetti
Electrochemistry,"Chemistry Analytical
Journal title
Journal of electroanalytical chemistry [1992]
ISSN journal
15726657 → ACNP
Volume
444
Issue
2
Year of publication
1998
Pages
203 - 207
Database
ISI
SICI code
Abstract
Chemical deposition of foreign metals such as Pt, Au, Cu and Zn on a P d sheet was carried out by using hydrogen atoms passing through the Pd sheet (thickness, 50 mu m) which served as a working electrode for wa ter electrolysis to produce H atoms, a separator between the electroch emical and chemical reaction compartments, a selectively permeable mem brane of H atoms and a chemical reaction field for hydrogenation. The amounts of Pt and Au were found to increase linearly with electrolysis time in the 6 M KOH side of a two-compartment cell, whereas Cu and Zn were scarcely deposited (less than 0.2 mg cm(-2)). This result can be explained in terms of the dissociative adsorbability of hydrogen on t hese metals. Its application to the hydrogenation of 4-methylstyrene w as also investigated by using the same electrochemical cell. It became clear that the deposition of noble metals such as Pt and Au on a Pd s heet greatly improves the hydrogenation rate of 4-methylstyrene as com pared with a bare Pd sheet, while no hydrogenation products were detec ted in the case of the Pd sheet on which Cu or Zn had been deposited. This is because, in contrast to Pd, Pt and Au, both Cu and Zn have onl y very weak catalytic activity for hydrogenation, and they rather supp ress the hydrogen diffusion through the Pd sheet, as proved by measure ments of H permeation. (C) 1998 Elsevier Science S.A. All rights reser ved.