Hj. Im et al., BALLISTIC-ELECTRON-EMISSION MICROSCOPY STUDY OF SCHOTTKY CONTACTS ON 6H-SIC AND 4H-SIC, Applied physics letters, 72(7), 1998, pp. 839-841
We have performed ballistic-electron emission microscopy (BEEM) on (Pd
,Pt)/ (6H,4H)-SiC(0001) Schottky contacts. Schottky barrier heights (S
BHs) determined from the BEEM data using the Bell-Kaiser model are 1.2
7 eV/1.34 eV (Pd/Pt) for 6H- and 1.54 eV/1.58 eV for 4H-SiC. Our measu
rements also give the first direct evidence of a second conduction ban
d minimum (CBM) on 4H-SiC about 0.14 eV above the overall CBM. Spatial
inhomogeneity of SBHs were examined and shown to be no larger than th
e fitting error due to the system noise. Additionally, enhanced ballis
tic transmittance was observed over a region intentionally stressed by
injecting high kinetic energy (10 eV above EF) hot electrons using BE
EM in the Pt/4H-SiC sample. (C) 1998 American Institute of Physics.