BALLISTIC-ELECTRON-EMISSION MICROSCOPY STUDY OF SCHOTTKY CONTACTS ON 6H-SIC AND 4H-SIC

Citation
Hj. Im et al., BALLISTIC-ELECTRON-EMISSION MICROSCOPY STUDY OF SCHOTTKY CONTACTS ON 6H-SIC AND 4H-SIC, Applied physics letters, 72(7), 1998, pp. 839-841
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
7
Year of publication
1998
Pages
839 - 841
Database
ISI
SICI code
0003-6951(1998)72:7<839:BMSOSC>2.0.ZU;2-P
Abstract
We have performed ballistic-electron emission microscopy (BEEM) on (Pd ,Pt)/ (6H,4H)-SiC(0001) Schottky contacts. Schottky barrier heights (S BHs) determined from the BEEM data using the Bell-Kaiser model are 1.2 7 eV/1.34 eV (Pd/Pt) for 6H- and 1.54 eV/1.58 eV for 4H-SiC. Our measu rements also give the first direct evidence of a second conduction ban d minimum (CBM) on 4H-SiC about 0.14 eV above the overall CBM. Spatial inhomogeneity of SBHs were examined and shown to be no larger than th e fitting error due to the system noise. Additionally, enhanced ballis tic transmittance was observed over a region intentionally stressed by injecting high kinetic energy (10 eV above EF) hot electrons using BE EM in the Pt/4H-SiC sample. (C) 1998 American Institute of Physics.