QUANTITATIVE IMAGING OF SHEET RESISTANCE WITH A SCANNING NEAR-FIELD MICROWAVE MICROSCOPE

We describe quantitative imaging of the sheet resistance of metallic t hin films by monitoring frequency shift and quality factor in a resona nt scanning near-held microwave microscope. This technique allows fast acquisition of images at approximately 10 ms per pixel over a frequen cy range from 0.1 to 50 GHz. In its current configuration, the system can resolve changes in sheet resistance as small as 0.6 Ohm/square for 100 Ohm/square films. We demonstrate its use at 7.5 GHz by generating a quantitative sheet resistance image of a YBa2Cu3O7-delta thin film on a 5 cm diam sapphire wafer. (C) 1998 American Institute of Physics.