K. Kuribayashi et R. Ueyama, EFFECT OF THE SUBSTRATE ON THE GROWTH OF SPINEL IRON-OXIDE THIN-FILMSBY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 295(1-2), 1997, pp. 16-18
Iron oxide thin films were deposited onto various substrates under var
ious O-2 how rates by metal-organic chemical vapor deposition. Spinel
Fe3O4+x was formed at lower O-2 flow rates on all substrates. However,
at higher O-2 how rates, a mixture of beta-Fe2O3 and spinel Fe3O2+x w
as formed on a non-alkaline glass and the (100) plane of SiTiO3 single
-crystal substrates, and highly (100) oriented spinel Fe3O4+x was form
ed on (100) MgO single crystals and on (100) oriented MgO buffer layer
s. Mainly (311) oriented spinel Fe3O4+x was formed on (111) oriented M
gO buffer layers. The experimental results are discussed with respect
to the lattice mismatch between spinel Fe3O4+x and the substrates.