EFFECT OF THE SUBSTRATE ON THE GROWTH OF SPINEL IRON-OXIDE THIN-FILMSBY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION

Citation
K. Kuribayashi et R. Ueyama, EFFECT OF THE SUBSTRATE ON THE GROWTH OF SPINEL IRON-OXIDE THIN-FILMSBY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION, Thin solid films, 295(1-2), 1997, pp. 16-18
Citations number
12
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
295
Issue
1-2
Year of publication
1997
Pages
16 - 18
Database
ISI
SICI code
0040-6090(1997)295:1-2<16:EOTSOT>2.0.ZU;2-4
Abstract
Iron oxide thin films were deposited onto various substrates under var ious O-2 how rates by metal-organic chemical vapor deposition. Spinel Fe3O4+x was formed at lower O-2 flow rates on all substrates. However, at higher O-2 how rates, a mixture of beta-Fe2O3 and spinel Fe3O2+x w as formed on a non-alkaline glass and the (100) plane of SiTiO3 single -crystal substrates, and highly (100) oriented spinel Fe3O4+x was form ed on (100) MgO single crystals and on (100) oriented MgO buffer layer s. Mainly (311) oriented spinel Fe3O4+x was formed on (111) oriented M gO buffer layers. The experimental results are discussed with respect to the lattice mismatch between spinel Fe3O4+x and the substrates.