STUDY OF THE GROWTH MECHANISMS OF CHROMIUM NITRIDE FILMS DEPOSITED BYVACUUM-ARC EVAPORATION

Chromium nitride films have been deposited using the vacuum are evapor ation technique. The influence of the main deposition parameters (nitr ogen pressure p(N2), substrate temperature T-s, substrate bias voltage V-s and argon partial pressure p(Ar)) on the structural and mechanica l properties of the coatings has been investigated. It has been found that the nitrogen pressure determines the phase composition in the lay ers, while T-s, V-s and p(Ar) have more direct effects on the texture of the films. The mechanical properties which depend on the compositio n but also on the structure and the morphology of the coatings, exhibi t a strong dependence on all the deposition parameters. (C) 1997 Elsev ier Science S.A.