HIGH-RATE DUAL-TARGET DC MAGNETRON SPUTTER-DEPOSITION OF ELECTROCHROMIC MOO3 FILMS

Authors
KHARRAZI M AZENS A KULLMAN L GRANQVIST CG
Citation
M. Kharrazi et al., HIGH-RATE DUAL-TARGET DC MAGNETRON SPUTTER-DEPOSITION OF ELECTROCHROMIC MOO3 FILMS, Thin solid films, 295(1-2), 1997, pp. 117-121
Citations number
39
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
Thin solid films → ACNP
ISSN journal
00406090
Volume
295
Issue
1-2
Year of publication
1997
Pages
117 - 121
Database
ISI
SICI code
0040-6090(1997)295:1-2<117:HDDMSO>2.0.ZU;2-A
Abstract
Mo oxide films with good electrochromic properties were produced by si ngle-target and dual-target reactive d.c. magnetron sputtering. Dual-t arget deposition was shown capable of yielding optically functional fi lms at a rate similar to 20 times higher than that for single-target d eposition, which is a result of considerable technical interest. (C) 1 997 Elsevier Science S.A.