Cs. Hwang et al., INFLUENCE OF THE MICROSTRUCTURE OF PT SI SUBSTRATES ON TEXTURED GROWTH OF BARIUM-TITANATE THIN-FILMS PREPARED BY PULSED-LASER DEPOSITION/, Journal of materials research, 13(2), 1998, pp. 368-375
Pt-coated silicon substrates with strong (111) Pt texture were anneale
d in an oxidizing atmosphere at temperatures from 500 degrees C to 750
degrees C. BaTiO3 thin films were deposited by pulsed laser ablation
on the substrates. Observation by transmission electron microscopy sho
wed that the substrate anneal caused the formation of TiO2 in the Pt l
ayer, accompanied by the formation of a high density of faceted protru
sions on the Pt surface, particularly at the higher anneal temperature
s. The Pt protrusions had (111) facets, parallel to the substrate surf
ace, on which (100)-oriented BaTiO3 grains were observed. BaTiO3 grain
s with an epitaxial relationship to the Pt lattice were observed on in
clined facets of the Pt protrusions [which were not (111) planes], and
also on the nonplanar regions of the Pt surface. These epitaxial BaTi
O3 grains had (111) preferred orientation relative to the substrate su
rface. Thus, the BaTiO3 films displayed bimodal growth behavior, with
both (100) texture and (111) epitaxy. We propose a model for this beha
vior based on surface energy considerations.