IN-SITU DETERMINATION OF THE SURFACE-ROUGHNESS OF DIAMOND FILMS USINGOPTICAL PYROMETRY

The initial growth of diamond films in a microwave plasma reactor has been studied using in situ two-color infrared pyrometry. Analysis of t he observed oscillations of the apparent temperature has yielded the s ubstrate temperature and also the instantaneous film growth rate and r ms surface roughness sigma. Two distinct regimes of growth have been c learly identified: an initial period of rapidly increasing sigma befor e the diamond nuclei coalesce, followed by a slower increase of sigma with thickness as the continuous film grows further. The differing ini tial roughnesses and emissivities of Si and Mo substrates have been sh own to have important effects on the growth of diamond. (C) 1998 Ameri can Institute of Physics.