A REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND ATOMIC-FORCE MICROSCOPY STUDY OF THE CHEMICAL BEAM EPITAXIAL-GROWTH OF INAS AND INP ISLANDS ON (001)GAP
B. Junno et al., A REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND ATOMIC-FORCE MICROSCOPY STUDY OF THE CHEMICAL BEAM EPITAXIAL-GROWTH OF INAS AND INP ISLANDS ON (001)GAP, Applied physics letters, 72(8), 1998, pp. 954-956
Pie have studied the formation of strained InAs and InP island structu
res on GaP surfaces grown by chemical beam epitaxy. InP grows pseudomo
rphically for 3 ML before island crystallization is observed by reflec
tion high-energy electron diffraction, following a typical Stranski-Kr
astanov growth mode. For the growth of In.4s on GaP, three-dimensional
diffraction peaks are observed after 0.9 ML of InAs have been deposit
ed, indicating a Volmer-Weber growth mode. Atomic force microscopy stu
dies of these structures are presented and the optical properties are
discussed. (C) 1998 American Institute of Physics.