A REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND ATOMIC-FORCE MICROSCOPY STUDY OF THE CHEMICAL BEAM EPITAXIAL-GROWTH OF INAS AND INP ISLANDS ON (001)GAP

Citation
B. Junno et al., A REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION AND ATOMIC-FORCE MICROSCOPY STUDY OF THE CHEMICAL BEAM EPITAXIAL-GROWTH OF INAS AND INP ISLANDS ON (001)GAP, Applied physics letters, 72(8), 1998, pp. 954-956
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
8
Year of publication
1998
Pages
954 - 956
Database
ISI
SICI code
0003-6951(1998)72:8<954:ARHEAA>2.0.ZU;2-#
Abstract
Pie have studied the formation of strained InAs and InP island structu res on GaP surfaces grown by chemical beam epitaxy. InP grows pseudomo rphically for 3 ML before island crystallization is observed by reflec tion high-energy electron diffraction, following a typical Stranski-Kr astanov growth mode. For the growth of In.4s on GaP, three-dimensional diffraction peaks are observed after 0.9 ML of InAs have been deposit ed, indicating a Volmer-Weber growth mode. Atomic force microscopy stu dies of these structures are presented and the optical properties are discussed. (C) 1998 American Institute of Physics.