MICROSCOPIC MECHANISM FOR MECHANICAL POLISHING OF DIAMOND(110) SURFACES

Authors
JARVIS MR PEREZ R VANBOUWELEN FM PAYNE MC
Citation
Mr. Jarvis et al., MICROSCOPIC MECHANISM FOR MECHANICAL POLISHING OF DIAMOND(110) SURFACES, Physical review letters, 80(16), 1998, pp. 3428-3431
Citations number
15
Categorie Soggetti
Physics
Journal title
Physical review letters → ACNP
ISSN journal
00319007
Volume
80
Issue
16
Year of publication
1998
Pages
3428 - 3431
Database
ISI
SICI code
0031-9007(1998)80:16<3428:MMFMPO>2.0.ZU;2-X
Abstract
Mechanically induced degradation crf diamond, as occurs during polishi ng, is studied using total-energy pseudopotential calculations. The st rong asymmetry in the rate of polishing between different directions o n the diamond (110) surface is explained in terms of an atomistic mech anism for nanogroove formation. The postpolishing surface morphology a nd the nature of the polishing residue predicted by this mechanism are consistent with experimental evidence.