SELF-INTERSTITIAL SHALLOW-DONOR COMPLEXES IN SILICON - AN ELECTRON-PARAMAGNETIC-RESONANCE STUDY

Citation
O. Scheerer et al., SELF-INTERSTITIAL SHALLOW-DONOR COMPLEXES IN SILICON - AN ELECTRON-PARAMAGNETIC-RESONANCE STUDY, Physical review. B, Condensed matter, 57(16), 1998, pp. 9657-9662
Citations number
33
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
57
Issue
16
Year of publication
1998
Pages
9657 - 9662
Database
ISI
SICI code
0163-1829(1998)57:16<9657:SSCIS->2.0.ZU;2-T
Abstract
An electron-paramagnetic-resonance (EPR) study on silicon samples quen ched after diffusion of gold (or platinum) from a metallic layer on th e surface results in the presence of two types of paramagnetic centers replacing the donor P center. According to the analysis these centers consist of a P donor with a self-interstitial in either the nearest-n eighbor (NN) or next-nearest-neighbor (NNN) position. This result supp orts the early assumption that large amounts of self-interstitials are produced by such a treatment. P (or As) impurities act as stabilizing entities. This is verified by a modified donor hyperfine interaction which exhibits a strong temperature dependence. The results are explai ned by strain fields and a chemical shift caused by a self-interstitia l neighboring a phosphorus atom. Two configurations of this complex di ffer only slightly in energy. [S0163-1829(98)04516-0].