O. Scheerer et al., SELF-INTERSTITIAL SHALLOW-DONOR COMPLEXES IN SILICON - AN ELECTRON-PARAMAGNETIC-RESONANCE STUDY, Physical review. B, Condensed matter, 57(16), 1998, pp. 9657-9662
An electron-paramagnetic-resonance (EPR) study on silicon samples quen
ched after diffusion of gold (or platinum) from a metallic layer on th
e surface results in the presence of two types of paramagnetic centers
replacing the donor P center. According to the analysis these centers
consist of a P donor with a self-interstitial in either the nearest-n
eighbor (NN) or next-nearest-neighbor (NNN) position. This result supp
orts the early assumption that large amounts of self-interstitials are
produced by such a treatment. P (or As) impurities act as stabilizing
entities. This is verified by a modified donor hyperfine interaction
which exhibits a strong temperature dependence. The results are explai
ned by strain fields and a chemical shift caused by a self-interstitia
l neighboring a phosphorus atom. Two configurations of this complex di
ffer only slightly in energy. [S0163-1829(98)04516-0].