NONSPECULAR X-RAY-REFLECTIVITY STUDY OF PARTIALLY CORRELATED INTERFACE ROUGHNESS OF A MO SI MULTILAYER/

Nonspecular x-ray-reflectivity intensities were measured to characteri ze the interface morphology of a Mo/Si multilayer. Longitudinal off-sp ecular scans and transverse scans at several multilayer peaks and vall eys were carried out. For the analysis of the experimental data, a hei ght cross-correlation function between different interfaces was derive d for a model multilayer whose interfaces are partially correlated. Th e parameters related to the interface morphology were obtained by fitt ing the measured intensities within the distorted-wave Born approximat ion. The intermixing widths of the graded interfaces, the correlated i nterface roughness amplitude, and a vertical correlation length were o btained by analyzing the off-specular intensities. [S0163-1829(98)0461 5-3].