REACTIVE SPUTTERING OF YBACUO THIN-FILMS ON POLYCRYSTALLINE ZIRCONIA SUBSTRATES - OPTIMIZATION RESULTS

Citation
A. Degardin et al., REACTIVE SPUTTERING OF YBACUO THIN-FILMS ON POLYCRYSTALLINE ZIRCONIA SUBSTRATES - OPTIMIZATION RESULTS, EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 1(1), 1998, pp. 1-6
Citations number
10
Categorie Soggetti
Physics, Applied
ISSN journal
12860042
Volume
1
Issue
1
Year of publication
1998
Pages
1 - 6
Database
ISI
SICI code
1286-0042(1998)1:1<1:RSOYTO>2.0.ZU;2-4
Abstract
In situ elaboration of YBaCuO thin films, on polycrystalline yttria do ped zirconia substrates, has been optimized. A reactive sputtering mod el has been developed and the electrical conductivity of the substrate has been studied as a function of temperature and doping. The J(c) va lue of approximate to 3 x 10(4) A/cm(2) at 77 K, measured on microbrid ges, is among the best reported in the literature for this substrate t ype.