Fourier transform infrared spectroscopy measurements have been carried
out on liquid-encapsulated Czochralski-grown undoped InP wafers, whic
h reproducibly become semi-insulating upon annealing in an ambient of
phosphorus at 800-900 degrees C. The measurements reveal a high concen
tration of hydrogen complexes in the form VInH4 existing in the materi
al before annealing in agreement with recent experimental studies. It
is argued that the dominant and essential process producing the semi-i
nsulating behavior is the compensation produced by an EL2-like deep do
nor phosphorus antisite defect, which is formed by the dissociation of
the hydrogen complexes during the process of annealing. The deep dono
r compensates accepters, the majority of which are shallow residual ac
ceptor impurities and deep hydrogen associated V-In and isolated V-In
levels, produced at the first stage of the dissociation of the VInH4 c
omplex. The high concentration of indium vacancies produced by the dis
sociation are the precursor of the EL2-like phosphorus antisite. These
results show the importance of hydrogen on the electrical properties
of InP and indicate that this largely results from low formation energ
y of the complex VInH4 in comparison with that of an isolated V-In. (C
) 1998 American Institute of Physics.