ELECTROLUMINESCENCE FROM MECHANICALLY DAMAGED OXIDIZED SILICON

Citation
J. Yuan et al., ELECTROLUMINESCENCE FROM MECHANICALLY DAMAGED OXIDIZED SILICON, Journal of applied physics, 83(8), 1998, pp. 4385-4388
Citations number
17
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
83
Issue
8
Year of publication
1998
Pages
4385 - 4388
Database
ISI
SICI code
0021-8979(1998)83:8<4385:EFMDOS>2.0.ZU;2-Y
Abstract
We have found significant electroluminescence (EL), clearly visible in room light, to be produced from lightly oxidized Si wafers, which hav e been mechanically scratched, or indented with a diamond tip. The EL occurs in the visible and infrared ranges. Undamaged oxidized samples, where the oxide is chemically thinned to allow current from a top con tact to pass, also show similar EL. However, damaged Si wafers that ha ve only normal thin or no oxide, show negligible EL. A search for quan tum-confined particles in indentation pits by scanning tunneling micro scopy does not show any present. The results point strongly to the EL mechanism being related to the damage creating areas of optimum oxide thickness. The results are compared with those from spark-processed an d laser-grooved silicon. (C) 1998 American Institute of Physics.