THERMIONIC ELECTRON-EMISSION FROM NARROW BAND-GAP SEMICONDUCTORS UNDER PICOSECOND LASER EXCITATION

Citation
Ss. Mao et al., THERMIONIC ELECTRON-EMISSION FROM NARROW BAND-GAP SEMICONDUCTORS UNDER PICOSECOND LASER EXCITATION, Journal of applied physics, 83(8), 1998, pp. 4462-4465
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
83
Issue
8
Year of publication
1998
Pages
4462 - 4465
Database
ISI
SICI code
0021-8979(1998)83:8<4462:TEFNBS>2.0.ZU;2-K
Abstract
A model is presented to relate picosecond laser induced thermionic ele ctron emission to the carrier and phonon dynamics of semiconductors. S ilicon is chosen as a model material since its optical and thermal pro perties are well characterized. The temporal profiles of thermionic em ission current and total electron yield are obtained as a function of incident laser fluence for different surface conditions, below the sil icon surface melting threshold. Two distinct regimes have been found f or the dependence of the electron yield on the laser fluence due to th ermionic emission and this behavior is related to Auger recombination.