M. Topic et al., NUMERICAL-ANALYSIS OF A THIN MICROCRYSTALLINE-P LAYER IN P-I-N A-SI-HSOLAR-CELLS, Journal of applied physics, 83(8), 1998, pp. 4518-4521
We have used our numerical simulator to examine the function of a thin
microcrystalline p(mu c-Si:H) layer in a p-i-n hydrogenated amorphous
silicon (n-Si:H) based solar cell. In the analysis of a p(mu c-Si:H)-
i-n structure, three parameter sets were chosen for the purpose of ver
ifying the validity of the reported measured p(mu c-Si:H) material par
ameters. The results revealed that the correct setting of the p(mu c-S
i:H) work function is of prime importance. Analysis of a double window
layer with an inserted p(a-SiC:H) layer and an accompanying i(a-SiC:H
) buffer layer in the p(mu c-Si:H)-i-n structure showed that the i(a-S
iC:PI) buffer layer beneficially affects the J(SC) and fill factor and
furthermore, the insertion of a few nanometers thick p(a-SiC:PI) laye
r between the p(mu c-Si:H) layer and i(a-SiC:H) buffer layer additiona
lly improves the solar cell performance. (C) 1998 American Institute o
f Physics.