A hybrid microlens/aperture mask assembly is fabricated, aligned and m
ounted on a CCD imager for an application in an imaging polarimeter. T
he microlens array is produced by direct laser writing in photoresist
followed by electroforming and replication onto a glass substrate in r
egistration with a slit aperture array on the reverse side. An alignme
nt of the combined arrays to the CCD imager of better than 0.7 mu m in
lateral position and 0.005 deg rotation is achieved, Stray light of l
ess than 1% was measured for the hybrid module. The optical microsyste
m satisfied the challenging requirements of the imaging polarimeter an
d the technique has applications in other areas of optical sensing, me
trology and processing. (C) 1997 Society of Photo-Optical Instrumentat
ion Engineers.