The growth of coalesced, highly oriented diamond films has been achiev
ed on nickel substrates using a multistep process that consisted of (i
) seeding the Ni surface with 0.5 mu m diamond powder, (ii) annealing
at 1100 degrees C in a hydrogen atmosphere, and (iii) growth at 900 de
grees C in a mixture of hydrogen and 0.5% methane. Auger depth profile
analysis of a sample quenched after the annealing stage showed the pr
esence of significant amounts of carbon (6 at. %) close to the substra
te surface and about 3 at. % deeper in the substrate. The loss of carb
on into the substrate resulted in relatively low nucleation density. T
he addition of methane into the gas phase during the annealing stage p
roved very effective in compensating for the diffusion, An addition of
0.5% methane in the gas phase produced optimum results, as the nuclea
tion density, orientation of diamond particles, and uniformity were su
bstantially improved. Substrates nucleated under these conditions were
grown our into coalesced, 30 mu m thick films. Both (100) and (111) o
riented films showed a high degree of orientation and Raman spectra ob
tained from these orientations showed intense and narrow diamond signa
ture peaks with FWHM's of 5 and 8 cm(-1), respectively.