A set of diamond films was grown by microwave chemical vapor depositio
n (MWCVD) using a CH4-H-2 gas mixture. Structural and crystallographic
defects were induced in the samples either by choosing a relatively h
igh substrate temperature, T-s = 950 degrees C, or by intentional cont
amination. In addition, different preferential orientations were obtai
ned by appropriate changes to the CH4 concentration in the gas mixture
. The resulting films were characterized by scanning electron microsco
py (SEM), X-ray diffraction (XRD) and Raman spectroscopy. Room tempera
ture and liquid nitrogen temperature cathodoluminescence (CL) were inv
estigated in the 200-800 nm wavelength range. A clear correlation with
the growth conditions of the so-called band-A emission (435 nm) and o
f some sharp spectral features was observed. An explanation of this ef
fect is given in terms of crystal defects which are induced by the gro
wth process. (C) 1997 Elsevier Science S.A.