XPS, USXS AND PLS INVESTIGATIONS OF POROUS SILICON

Citation
Ep. Domashevskaya et al., XPS, USXS AND PLS INVESTIGATIONS OF POROUS SILICON, Journal of electron spectroscopy and related phenomena, 88, 1998, pp. 969-972
Citations number
7
Categorie Soggetti
Spectroscopy
ISSN journal
03682048
Volume
88
Year of publication
1998
Pages
969 - 972
Database
ISI
SICI code
0368-2048(1998)88:<969:XUAPIO>2.0.ZU;2-0
Abstract
X-ray photoelectron spectra (XPS) as well as ultrasoft X-ray spectra ( USXS) of porous silicon have been investigated. The samples were obtai ned by electrochemical etching of silicon plates in an alchohol soluti on of HF. Silicon 2p core states and Si 1(2,3) spectra of 'as-obtained ' samples as well as those annealed in the atmosphere were obtained. A ll the samples show an increase of oxidation in porous layers with tem perature. However, the degree of oxidation in the sample annealed at h igh temperatures for 20 sec is less than that annealed for 20 min at l ower temperatures. (C) 1998 Elsevier Science B.V.