O. Schmidt et al., CHEMICAL MICROANALYSIS BY SELECTED-AREA ESCA USING AN ELECTRON-ENERGYFILTER IN A PHOTOEMISSION MICROSCOPE, Journal of electron spectroscopy and related phenomena, 88, 1998, pp. 1009-1014
We present a new and simple device for microspectroscopy being indepen
dent of the mode of electron-excitation. Micro-Xray photoelectron spec
troscopy, electron-induced Anger-spectroscopy, as well as local energy
-loss spectroscopy were used to investigate metal-adsorption on silico
n. This new approach employs a non-imaging electron energy analyser at
tached to a new-generation photoemission electron microscope with inte
gral microarea selector. Photoelectron microspectroscopy was performed
using the direct beam of an undulator (U2 at BESSY) being monochromat
ised and focused by means of multilayer optics at hv = 95 eV. Similarl
y, local Auger-electron and EELS spectra have been taken using a simpl
e electron gun for the excitation. The chemical compositions of inhomo
genities in thin layers of indium on silicon and the local state of ox
idation of a structured Pt-Co multilayer have been determined. (C) 199
8 Elsevier Science B.V.