HIGH-FINESSE ALXOY ALGAAS NONABSORBING OPTICAL CAVITY/

Citation
He. Shin et al., HIGH-FINESSE ALXOY ALGAAS NONABSORBING OPTICAL CAVITY/, Applied physics letters, 72(18), 1998, pp. 2205-2207
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
72
Issue
18
Year of publication
1998
Pages
2205 - 2207
Database
ISI
SICI code
0003-6951(1998)72:18<2205:HAANOC>2.0.ZU;2-#
Abstract
We report the measured finesse value of similar to 390 in nonabsorbing AlxOy/AlGaAs cavities. The nonabsorbing cavity consisting of a bottom AlxOy/AlGaAs distributed Bragg reflector (DBR), an AlxOy spacer layer , and a top AlxOy/AlGaAs DBR is prepared by a wet-oxidation process. T he measured resonance linewidth agrees well with that of calculation, indicating very small overall losses in the cavity. The wet-oxidation process does not seem to degrade the interface of the epitaxial layers significantly. The lower bound of maximum achievable reflectivity fro m the AlxOy DBR is estimated to be >99.95%, assuming an average interf ace roughness of about 0.6 nm. The maximum achievable finesse of this type of cavity is expected to be larger than that of the all-epitaxial counterpart assuming the same roughness. (C) 1998 American Institute of Physics.