Pm. Lee et al., APPLICATION OF CIRCUIT-LEVEL HOT-CARRIER RELIABILITY SIMULATION TO MEMORY DESIGN, IEICE transactions on electronics, E81C(4), 1998, pp. 595-601
We have applied hot-carrier circuit-level simulation to memory periphe
ral circuits of a few thousand to over 12K transistors using a simple
but accurate degradation model for reliability verification of actual
memory products. By applying simulation to entire circuits, it was fou
nd that the location of maximum degradation depended greatly upon circ
uit configuration and device technology. A design curve has been devel
oped to quickly relate device-level DC lifetime to circuit-level perfo
rmance lifetime. Using these results in conjunction with a methodology
that has been developed to predict hot-carrier degradation early in t
he design cycle before TEG fabrication, accurate total-circuit simulat
ion is applied early in the design process, making reliability simulat
ion a crucial design tool rather than a verification tool as technolog
y advances into the deep sub-micron high clock rate regime.