ELECTRICAL-PROPERTIES OF TINX FILMS ON P-SILICON SUBSTRATES OBTAINED BY REACTIVE ION-BEAM-ASSISTED DEPOSITION TECHNIQUE

Authors
NARSALE AM ALI YP KOTHARI DC GUZMAN L MIOTELLO A
Citation
Am. Narsale et al., ELECTRICAL-PROPERTIES OF TINX FILMS ON P-SILICON SUBSTRATES OBTAINED BY REACTIVE ION-BEAM-ASSISTED DEPOSITION TECHNIQUE, Journal of materials science letters, 17(8), 1998, pp. 637-639
Citations number
23
Categorie Soggetti
Material Science
Journal title
Journal of materials science letters → ACNP
ISSN journal
02618028
Volume
17
Issue
8
Year of publication
1998
Pages
637 - 639
Database
ISI
SICI code
0261-8028(1998)17:8<637:EOTFOP>2.0.ZU;2-M