FORMATION OF AN ORIENTED BETA-SIC LAYER DURING THE INITIAL GROWTH-PHASE OF DIAMOND ON SILICON-(100)

Citation
E. Maillardschaller et al., FORMATION OF AN ORIENTED BETA-SIC LAYER DURING THE INITIAL GROWTH-PHASE OF DIAMOND ON SILICON-(100), DIAMOND AND RELATED MATERIALS, 6(2-4), 1997, pp. 282-285
Citations number
18
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
6
Issue
2-4
Year of publication
1997
Pages
282 - 285
Database
ISI
SICI code
0925-9635(1997)6:2-4<282:FOAOBL>2.0.ZU;2-9
Abstract
The first minutes of bias-enhanced nucleation of chemical vapour depos ited (CVD) diamond have been investigated by X-ray photoelectron diffr action (XPD). The orientation of the SiC layer and of the nascent diam ond film has been studied. We will show that the bias pretreatment is not responsible for the formation of an oriented beta-SiC film oil sil icon (100) and that the contact of the diamond nuclei with an oriented layer is essential for an oriented nucleation. The influence of the s ubstrate heating in a hydrogen plasma before the beginning of the bias treatment on the diamond film orientation will be discussed. (C) 1997 Elsevier Science S.A.