EFFECTS OF ELECTRON AND ATOMIC-HYDROGEN IRRADIATION ON GAS-SOURCE MOLECULAR-BEAM EPITAXY OF DIAMOND WITH PURE METHANE

Citation
T. Nishimori et al., EFFECTS OF ELECTRON AND ATOMIC-HYDROGEN IRRADIATION ON GAS-SOURCE MOLECULAR-BEAM EPITAXY OF DIAMOND WITH PURE METHANE, DIAMOND AND RELATED MATERIALS, 6(2-4), 1997, pp. 463-467
Citations number
14
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
6
Issue
2-4
Year of publication
1997
Pages
463 - 467
Database
ISI
SICI code
0925-9635(1997)6:2-4<463:EOEAAI>2.0.ZU;2-O
Abstract
We investigated the effects of electron and atomic hydrogen irradiatio n on gas-source molecular beam epitaxy (GSMBE) of diamond with pure me thane (CH4). Irradiating the C(001) surface with a 200 eV electron-bea m at 800 degrees C enhanced the growth rate (GR) similar to 2-5 times over the method without irradiation. By using a CH4 beam decomposed by electron impact in addition to the electron-beam irradiation, the GR was enhanced by >100 times. However, the grown films contained an appr eciable amount of amorphous carbon. By contrast, irradiating the surfa ce with an atomic hydrogen beam enhanced the GR by about five-fold wit hout the concurrent growth of amorphous carbon. (C) 1997 Elsevier Scie nce S.A.