FROM MESOSCOPIC TO NANOSCOPIC SURFACE-STRUCTURES - LITHOGRAPHY WITH COLLOID MONOLAYERS

Authors
BURMEISTER F SCHAFLE C KEILHOFER B BECHINGER C BONEBERG J LEIDERER P
Citation
F. Burmeister et al., FROM MESOSCOPIC TO NANOSCOPIC SURFACE-STRUCTURES - LITHOGRAPHY WITH COLLOID MONOLAYERS, Advanced materials, 10(6), 1998, pp. 495
Citations number
16
Categorie Soggetti
Material Science
Journal title
Advanced materials → ACNP
ISSN journal
09359648
Volume
10
Issue
6
Year of publication
1998
Database
ISI
SICI code
0935-9648(1998)10:6<495:FMTNS->2.0.ZU;2-R
Abstract
Colloid monolayer lithography is briefly reviewed and demonstrated to be a powerful alternative technique for the nanostructuring of surface s. The Figure shows a colloid monolayer viewed through a TEM grid used to transport the monolayer to the desired substrate. The monolayer an d grid together form a lithographic mask that can later be removed to leave, for example, a pattern of deposited gold dots.