A NEW METHOD OF GROWING YBA2CU3OY 45-DEGREES BI-EPITAXIAL THIN-FILMS ON MGO SUBSTRATE

Citation
Sh. Tsai et al., A NEW METHOD OF GROWING YBA2CU3OY 45-DEGREES BI-EPITAXIAL THIN-FILMS ON MGO SUBSTRATE, Zhongguo wuli xuekan, 36(2), 1998, pp. 355-359
Citations number
6
Categorie Soggetti
Physics
Journal title
ISSN journal
05779073
Volume
36
Issue
2
Year of publication
1998
Part
2
Pages
355 - 359
Database
ISI
SICI code
0577-9073(1998)36:2<355:ANMOGY>2.0.ZU;2-N
Abstract
We have developed a new bi-epitaxial structure, namely YBCO/CeO2/YSZ/P rBCO/MgO and YBCO/CeO2/YSZ/MgO boundary to replace the original YBCO/C eO2/YSZ/MgO and YBCO/MgO boundary. The new structure has several advan tages. One is for the device fabrication consideration because the non -superconducting PrBCO thin films with brown color can be used as an e ndpoint detection for dry etching. The second one is to reduce the mis match between YBCO and MgO substrate. The third benefit is to get rid of a small amounts of 45 degrees orientation in YBCO/MgO, which might cause the junction to be shorted. X-ray phi scans are performed to cha racterize the epitaxial grouth and crystalline axis rotations. Critial currents of 2 mm wide junctions are measured.