EFFECTS OF THE SUBSTRATE CRYSTALS UPON THE STRUCTURE OF THERMAL OXIDELAYERS ON SI

Comparisons of Bragg reflections from thermal oxide thin films on Si w afers were made for five sets of samples with various kinds of substra tes. The intensities of the reflections for the samples with the subst rate of batter quality were stronger than those of poor one. indicatin g that the structures of the crystalline SiO2 in the oxide layer were related with the quality of ti-ie Si substrates. It is also shown that no diffraction peaks were observed from the oxide layers grown on Si substrates by chemical vapor deposition.