Ka. Ritley et al., POS-SPRITE - AN EXTENSIBLE CALCULATION OF POSITRON AND ELECTRON IMPLANTATION IN METALS, Computer physics communications, 109(2-3), 1998, pp. 93-110
Accurately modeling the behavior of a beam of positrons incident upon
a solid is of crucial importance for depth-profiling and data analysis
in slow positron experiments. We describe a suite of Fortran programs
to perform a Monte Carlo calculation of positron implantation in amor
phous metals and small bandgap semiconductors. This provides statistic
al information about penetration (stopping profiles, thermalization ti
me, etc.), energy loss and reemission (backscattering, thin film trans
mission, etc.), The calculation is implemented using a user-friendly M
onte Carlo transport ''engine'', which is capable of treating particle
transport in infinite, semi-infinite, and multilayer systems. A conti
ngent of elastic (up to 10 keV) and inelastic (down to 30 eV) scatteri
ng mechanisms is included, but different mechanisms can be added via e
xternal data files or code modification. As a consequence of the scatt
ering theory involved, this calculation is amenable to electron implan
tation and scattering. (C) 1998 Elsevier Science B.V.