S. Vandijken et al., ENERGETICS AND STRUCTURE OF THE STABLE AND UNSTABLE BIATOMIC STEP EDGES OF SI(001), Surface review and letters, 5(1), 1998, pp. 15-20
The atomic geometry of Si(001) with a misorientation of 4.5 degrees to
wards [110] has been studied with scanning tunneling microscopy. Speci
al attention has been paid to the buckling registry of the dimers and
atoms near the biatomic step edge. For the arrangement of the atoms ne
ar the steps and at kink positions some simple rules are given. The bi
atomic step edge formation energies have been determined by analyzing
the step edge roughness. The ordering of the various types of step edg
es is in perfect agreement with total energy calculations performed by
Chadi [Phys. Rev. Lett. 59, 1691 (1987)]. Finally, the transition fro
m a surface with single steps to a surface with double steps has been
calculated to occur at a miscut angle of 1.5 degrees.