STRUCTURED ROUGHNESS OF SI SURFACE OBTAINED BY MOLECULAR-BEAM EPITAXYON HIGHLY MISORIENTED SI(111) SUBSTRATE

Citation
Jm. Gay et al., STRUCTURED ROUGHNESS OF SI SURFACE OBTAINED BY MOLECULAR-BEAM EPITAXYON HIGHLY MISORIENTED SI(111) SUBSTRATE, Surface review and letters, 5(1), 1998, pp. 31-36
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Physics, Atomic, Molecular & Chemical","Material Science
Journal title
ISSN journal
0218625X
Volume
5
Issue
1
Year of publication
1998
Pages
31 - 36
Database
ISI
SICI code
0218-625X(1998)5:1<31:SROSSO>2.0.ZU;2-0
Abstract
We present the results of an X-ray analysis of the surface morphology of a sample obtained by Si MBE onto a highly misoriented Si(111) subst rate. X-ray reflectivity and diffuse scattering provide a description of the surface. The amplitude of the surface profile is about 6.6 nm, with a sawtooth shape. Satellites in the diffuse scattering indicate a 215 +/- 5 nm periodicity in the miscut direction. The analysis of sat ellite intensities shows an asymmetry of the surface shape. The result s are in agreement with AFM images of the surface.