P. Dabo et al., HYDROGEN ACTIVATION OF SPECTROSCOPIC GRAPHITE SURFACE BY ARGON PLASMA-ETCHING, Journal of Applied Electrochemistry, 28(6), 1998, pp. 601-606
Argon plasma bombardment was successfully used for the hydrogen activa
tion of spectroscopic graphite electrodes. The hydrogen evolution reac
tion (HER) in 1 M KOH was investigated using electrochemical technique
s such as galvanostatic polarization and a.c. impedence spectroscopy;
the electrode surface was characterized by SEM. It is shown that the r
ate of HER at a given hydrogen overpotential value increases exponenti
ally with the etching time (ET), up to ETs of 30 min, and slightly dec
reases from 30 to 60 min. The double-layer capacity (C-dl) was establi
shed against the hydrogen overpotential for different ETs, with C-dl r
eaching its maximum for ETs of 30 min. Moreover, it is shown that the
etching process also leads to a significant increase in intrinsic acti
vity toward HER.