M. Chandhok et Jw. Grizzle, MODELING THE PRESSURE-DEPENDENCE OF DC BIAS VOLTAGE IN ASYMMETRIC, CAPACITIVE RF SHEATHS, IEEE transactions on plasma science, 26(2), 1998, pp. 181-189
A semianalytical model for capacitively coupled radio frequency (RF) s
heaths of asymmetric (unequal electrode area) systems has been develop
ed, It can be applied in the high-frequency (omega > omega(pi)) regime
at different pressures, An analytical approximation to the pressure-d
ependent ion density profile is used. The time-varying electric field
and potential within the sheath are obtained by solving Poisson's equa
tion. The current balance and zero net de current conditions are appli
ed to solve for the RF sheath parameters and de bias voltage. The de v
oltage ratio between the powered and grounded electrode sheaths increa
ses as the pressure decreases, which results in a larger de bias volta
ge at lower pressures.