The present work investigates the Be diffusion mechanisms during the p
ost-growth annealing in GaInAs epitaxial layers grown by Chemical Beam
Epitaxy (CBE) method. In parallel with our experimental study, to exp
lain the observed depth profiles, obtained by Secondary Ion Mass Spect
rometry (SIMS) analysis, we proposed the appropriate models of Be diff
usion in the case of point defect nonequilibrium. (C) 1998 Elsevier Sc
ience Ltd. All rights reserved.